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As the structures in semiconductor devices become smaller and faster, it becomes increasingly difficult to achieve the high speed performance and low resistance intrinsic to conventional single, twin, and dual damascene metallization schemes. To meet these goals, a multiple-damascene process has been adopted in which a series of conformal interconnect layers are alternately deposited and etched. In typical multiple-damascene processes, a substrate is first covered with a dielectric layer. A series of pre-clean and etching operations is performed to etch a predetermined pattern of holes or trenches in the dielectric layer. The next step of the process involves depositing the interconnect lines or vias in the trenches and then filling the holes or trenches with a conductive material to form the interconnect metallurgy. A polish and/or planarization operation is used to planarize the surface between the trenches. A series of pre-clean and etching operations may also be used to strip the excess conductive material from the surface of the dielectric layer. Using this process, lines or vias can be patterned on the surface.
As devices continue to shrink in size, the use of damascene processes for forming contacts to and between individual devices becomes increasingly difficult. Often it is necessary to form high aspect ratio vertical contacts or trenches in the dielectric
The key is pretty much the answer. ‘The key’ is whatever ‘all your lines’. Download Ultimate UFD2 Decrypter.rar. Ufd2 hash decrypter.@bib31]; [@bib30]). The only existing knowledge of a decline in rubella immunity among vaccine-eligible pregnant women comes from a small study of naturally occurring infections among pregnant women in eastern Nicaragua ([@bib10]).
We acknowledge that women presenting for ANC and/or delivery at this clinic receive vaccination services from multiple sources; however, the observed effect of calendar year on the odds of vaccination remained significant after adjustment for the number of source clinics (adjusted *P* = 0.004). Our findings should also be interpreted in light of limitations. Our outcome was vaccination status and not confidence in the vaccine. We used logistic regression to identify associations between time and both vaccination and confidence in vaccine, and the risk of selection bias in the data is possible. We only looked at three time periods. We did not observe a dip in measles immunity during this time period (data not shown), and therefore, we suspect that vaccination uptake among pregnant women may have been stable. Data regarding vaccine-eligible women’s pregnancy status and/or number of pregnancies were not available.
Despite these limitations, our study may be the first to provide evidence of a dip in rubella immunity among pregnant women. Our results suggest that earlier studies of measles immunity among pregnant women ([@bib10]) may be explained by a decrease in rubella immunity among older and nonpregnant women. If the observed decline in immunity is real, it could suggest that pregnant women have greater risk for sporadic rubella infection due to less protection from natural immunity, and, consequently, vaccination might provide the best protection.
We are grateful for the collaboration and support we received from the icddr,b Central Directorate, the Dhaka Shishu, and the Matlab Maternal and Child Health Research Centre staff.
Supported in part by grant numbers 5SC3CYFNCK09 and 5T12HS000001 (Northwell Health), the National Institutes of Health, and the Centers for Disease Control and Prevention.
The authors declare no conflict of interest.
[^1]: These authors contributed equally to this work.
This invention relates to the manufacturing of integrated circuits and, more particularly, to a method of fabricating a semiconductor chip on an integrated circuit die where an electrically conductive